Fudzilla

ASML nearly ready to ship first EUV lithography scanner

ASML is on track to ship the industry’s first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML’s Twinscan EXE:5000 ...
Hosted on MSN

ASML’s top EUV tool is now key to Intel’s comeback plan

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular machine: ASML’s latest High-Numerical Aperture Extreme Ultraviolet scanner. By ...
SDxCentral

Intel receives its High-NA EUV scanner from ASML

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...
Hosted on MSN

Intel has championed High-NA EUV chipmaking tools, but costs and other limitations could delay industry-wide adoption: Report

Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and ...
Electronics Weekly

Measuring free-form wafer shape enables wafer distortion predictions

A new technique measures free-form wafer shape, write Marco Franchi, Wooptix, and Leon van Dijk, Ronald Otten, Richard Van ...